The
Working Group Meeting of the COST Action MP0601, Short
Wavelength Laboratory Sources, took place on 27-28 May, in
The
meeting was organized by the Institute
of Nuclear Physics,
The
organizational details are listed in the registration
form, the venue is shown at the attached map of the
Kraków centre.
The
following locations are linked to documents containing the agenda of the meeting, its
detailed program, and the list of emails of all participants.
Most
of talks and several posters presented at the meeting are accessible through
this web page. Links to these materials are listed below.
Thursday, May 27th
Session 1. Chair: Francois de Gaufridy de Dortan
Sergey
Zakharov
High brightness EUV light
source system development for actinic mask metrology
Inna
Bukreeva
Talbot
effect in x-ray waveguides
Alan
Michette
An update
on the UK Smart X-Ray Optics project
Session 2. Chair: Slawka Pfauntsch
István
Földes
Cleaning KrF laser pulses
with plasma mirrors
Jeremy Frey
Imaging
soft x-ray production and scattering
Ulf Zastrau
Temperature
and K -yield radial distributions in laser-produced solid density plasmas
Session 3. Chair: Reiner Dietsch
Torsten
Feigl
Coating of World's largest EUV mirror
Alexei Erko
Parallel fs
x-ray spectrometer
Frantisek
Dubecky
Progress in low
energy X-ray spectrometry using semi-insulating GaAs detectors
Gianni
SiC thin films
deposited at high temperature by means of excimer and Nd-YaG lasers
Andreas Oelsner
X-ray area detectors with
temporal resolution in the picosecond range
Friday, May 28th
Session 6. Chair: Peter Hoghoj
Henryk
Fiedorowicz
Application of laser
plasma EUV sources in processing polymers and nanoimaging
Frank
Barkusky
Damage and
ablation of optical materials under focused EUV radiation
Yevhen
Zabila
Direct
laser interference patterning of magnetic films
Session 7. Chair: Ulf Hinze
Alan
Michette
Report on MC meeting
Andrzej
Bartnik
EUV-initiated
surface changes in polymers
Ruben
Seisyan
ISTC grant #3857; design of
two colour - two pulse LPP EUV source
Session 8. Chair: Gerry O’Sullivan
John
Costello
Multiphoton
ionization in intense EUV free electron laser fields
Paolo Di Lazzaro
Novel
anti-counterfeiting technique by EUV lithography
Posters
P1. Vladimir Ac – Application of diamond in X-ray sources
P2. Jozef Kaiser – Application of the 46.9 nm capillary-discharge based
table-top Ar+8 XUV laser for
laser ablation
P3. Sebastian Bożek – Cells
irradiation complementary lines at IFJ PAN
P4. Blair Lebert & Wafa Kezzar – Coherence properties of a EUV/soft
x-ray
source for interference
lithography
P5. Zdenko Zápražný – Conditions
for absorption and phase contrast
mechanisms in imaging with a
laboratory microfocus X-ray source
P6. Klaus Mann – EUV/XUV radiation: a versatile tool for structural
and chemical surface analysis
P7. Francois de Gaufridy de Dortan – Fast temporal ionisation code
for an hydro-radiative code
P8. Jakub Bielecki – Investigations
of microstructure and hydraulic
permeability of rocks samples by means
of x-ray computed microtomography
measurement and simulations using
lattice Boltzmann method
P9. Ladislav Pina – Microfocus high brightness x-ray tubes metrology
P10. Vasily Zakharov – Modeling of EUV spectra from nonequilibrium xenon
plasma with high energy
electrons
P11. Paul Duggan – Silson x-ray optics
P12. Maurizio Donarelli – Table-top interference lithography as a tool
to fabricate lasers emitting
in the third window of optical communications.
P13. Marcin
Perzanowski – Theoretical background of the direct laser
interference
P14. Jerzy Pełka – Towards new biosensors. Structure and properties
of electrospun nanofibers
composed of ZnO
P15. Larissa Juschkin – Extreme
Ultraviolet Radiation: A Versatile Tool For Nanometrology
P16. Serhiy Danylyuk – EUV
Interference Lithography with a gas discharge source
P17. Veronika Pickova – Interaction experiments in the fs laboratory at CTU